First of three parts: Accuracy vs. speed, advanced device parasitics, counting attofarads, plotting contact capacitance.

Second of three parts: The effects of multicore designs, lowering the voltage and workarounds; smarter techniques needed.

Last of three parts: What happens after 22nm, the impact of 3D IC designs, FinFETs, stress, and thermal issues.

First of three parts: Density and radiation; the effect of multiple power islands and complexity; more rules.

Second of three parts: The effects of new process nodes; end of life considerations, and special circumstances for breaking the rules.

Last of three parts: The effects of disaggregation, restrictive design rules and economic considerations.

First of three parts: Power becomes major factor at advanced nodes; questions surface about whether verification is reliable enough.

Second of three parts: Heated arguments over strategy, accuracy and effectiveness; problems rise as power islands are added in.

Last of three parts: The myriad effects of low power, the differences between OVM and VMM, and establishing good coverage models.

First of three parts: Difficulties are myriad at 28nm and 22nm, but at least power is part of the discussion with area, performance and manufacturability.

Four executives from Virage Logic, Actel, Forte and Magma sound off on the effects of Moore’s Law and what it means to semiconductors.

Power optimization and its effect on embedded and multicore software

What tools are available when you get to ultra-low power designs? Answer: Not many.

Wally Rhines, chairman and CEO of Mentor Graphics, talks about what’s changing in design, the effect of low power, and who’s going to be doing the most advanced designs.

Power budgets may look small, but the amount of power that can be saved with different design approaches will surprise you.

Every power-saving trick turns into more mileage, and less time with a plug in the wall.

Low-Power Engineering sat down with two of the top experts—Robert Hoogenstryd, director of marketing for design analysis and signoff at Synopsys, and Carey Robertson, Calibre product marketing director at Mentor Graphics—to talk about what changes at 28nm and 22nm and why parasitic extraction is becoming so important.